X-Ray Photoelectron Sprectroscopy (XPS)
One type of spectroscopy at A&M-Commerce is X-Ray Photoelectron Spectroscopy (XPS). Such spectroscopy involves the study of the electrons emitted from a material under irradiation with X-rays.
The XPS instrument used is the Physical Electronics 5100 ESCA System. It consists of Mg/Al dual x-ray source and a hemispherical analyzer. Ray Photoelectron Spectrometer as shown in the picture. A thin film deposition facility has been designed and fabricated. It is attached to this unit and is shown towards the left side of the picture. This facility allows in situ characterization of surfaces and interfaces. Metallic films can be deposited at a controlled rate between < 1 monolayer/min to over 1 nm/ min. The substrate temperature can be varied from room temperature to 1173 K.